Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김용태 | - |
| dc.contributor.author | C. S. Kwon | - |
| dc.contributor.author | D. J. Kim | - |
| dc.contributor.author | J. Y. Lee | - |
| dc.contributor.author | I. H. Choi | - |
| dc.date.accessioned | 2024-01-21T21:09:30Z | - |
| dc.date.available | 2024-01-21T21:09:30Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1995-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145338 | - |
| dc.title | The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization. | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | J. of the Korean vacuum soc., v.v. 4, pp.79 - 83 | - |
| dc.citation.title | J. of the Korean vacuum soc. | - |
| dc.citation.volume | v. 4 | - |
| dc.citation.startPage | 79 | - |
| dc.citation.endPage | 83 | - |
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