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dc.contributor.author배귀남-
dc.contributor.author이춘식-
dc.contributor.author박승오-
dc.contributor.author안강호-
dc.date.accessioned2024-01-21T21:10:55Z-
dc.date.available2024-01-21T21:10:55Z-
dc.date.created2022-01-10-
dc.date.issued1995-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145362-
dc.languageKorean-
dc.title수직 웨이퍼상의 입자 침착속도의 측정-
dc.title.alternativeMeasurement of particle deposition velocity toward a vertical wafer surface-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation공기조화·냉동공학논문집, v.7, no.3, pp.521 - 527-
dc.citation.title공기조화·냉동공학논문집-
dc.citation.volume7-
dc.citation.number3-
dc.citation.startPage521-
dc.citation.endPage527-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthorparticle deposition velocity-
dc.subject.keywordAuthor입자침착속도-
dc.subject.keywordAuthor수직웨이퍼-
dc.subject.keywordAuthor대류확산-
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