DSpace at KIST: Characterization of nitrogen-doped TiO2 thin films prepared by metalorganic chemical vapor deposition

Full metadata record

DC Field	Value	Language
dc.contributor.author	이동헌	-
dc.contributor.author	조용수	-
dc.contributor.author	이월인	-
dc.contributor.author	이전국	-
dc.contributor.author	정형진	-
dc.date.accessioned	2024-01-21T21:43:43Z	-
dc.date.available	2024-01-21T21:43:43Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1994-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/145682	-
dc.title	Characterization of nitrogen-doped TiO2 thin films prepared by metalorganic chemical vapor deposition	-
dc.title.alternative	유기금속 화학 기상증착법으로 실리콘 기판위에 증착된 질소치환 TiO2 박막의 특성분석	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	한국요업학회지, v.31, no.12, pp.1577 - 1587	-
dc.citation.title	한국요업학회지	-
dc.citation.volume	31	-
dc.citation.number	12	-
dc.citation.startPage	1577	-
dc.citation.endPage	1587	-
dc.subject.keywordAuthor	MOCVD	-
dc.subject.keywordAuthor	TiO2	-
dc.subject.keywordAuthor	질소치환	-

Show Simple Item Record

KIST Library Institutional Repository