Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박달근 | - |
| dc.contributor.author | 전병수 | - |
| dc.contributor.author | 이중기 | - |
| dc.contributor.author | 신세희 | - |
| dc.date.accessioned | 2024-01-21T21:46:26Z | - |
| dc.date.available | 2024-01-21T21:46:26Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1994-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145728 | - |
| dc.title | Preparation of large area TiO2 thin films by low pressure chemical vapor deposition | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | 한국재료학회지, v.24, no.8, pp.861 - 869 | - |
| dc.citation.title | 한국재료학회지 | - |
| dc.citation.volume | 24 | - |
| dc.citation.number | 8 | - |
| dc.citation.startPage | 861 | - |
| dc.citation.endPage | 869 | - |
| dc.subject.keywordAuthor | CVD | - |
| dc.subject.keywordAuthor | titanium dioxide | - |
| dc.subject.keywordAuthor | thin film | - |
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