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dc.contributor.author염상섭-
dc.contributor.author윤영수-
dc.contributor.authorW. N. Kang-
dc.contributor.authorT. W. Kim-
dc.contributor.authorM. Jung-
dc.contributor.authorT. H. Park-
dc.contributor.authorK. Y. Seo-
dc.contributor.authorJ. Y. Lee-
dc.date.accessioned2024-01-21T22:02:24Z-
dc.date.available2024-01-21T22:02:24Z-
dc.date.created2022-01-10-
dc.date.issued1994-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145769-
dc.titleStructural properties of titanium dioxide films grown on p-Si by metalorganic chemical vapor deposition at low temperature.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationThin solid films, v.v. 238, pp.12 - 14-
dc.citation.titleThin solid films-
dc.citation.volumev. 238-
dc.citation.startPage12-
dc.citation.endPage14-
dc.subject.keywordAuthorthin films-
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