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Structural properties of titanium dioxide films grown on p-Si by metalorganic chemical vapor deposition at low temperature.

Authors

염상섭; 윤영수; W. N. Kang; T. W. Kim; M. Jung; T. H. Park; K. Y. Seo; J. Y. Lee

Issue Date

1994-01

Citation

Thin solid films, v.v. 238, pp.12 - 14

Keywords

thin films

URI

https://pubs.kist.re.kr/handle/201004/145769

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KIST Article > Others

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