DSpace at KIST: Low pressure chemical vapor deposition of silicon carbide

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DC Field	Value	Language
dc.contributor.author	송진수	-
dc.contributor.author	김영욱	-
dc.contributor.author	김동주	-
dc.contributor.author	최두진	-
dc.contributor.author	이준근	-
dc.date.accessioned	2024-01-21T22:05:34Z	-
dc.date.available	2024-01-21T22:05:34Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1994-01	-
dc.identifier.issn	1225-1372	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/145821	-
dc.title	Low pressure chemical vapor deposition of silicon carbide	-
dc.title.alternative	탄화규소의 저압 화학증착	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	요업학회지 = Journal of the Korean Ceramic Society, v.31, no.3, pp.257 - 264	-
dc.citation.title	요업학회지 = Journal of the Korean Ceramic Society	-
dc.citation.volume	31	-
dc.citation.number	3	-
dc.citation.startPage	257	-
dc.citation.endPage	264	-
dc.subject.keywordAuthor	silicon carbide	-
dc.subject.keywordAuthor	chemical vapor deposition	-
dc.subject.keywordAuthor	nicalon fiber	-
dc.subject.keywordAuthor	composites	-

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