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dc.contributor.author양승관-
dc.contributor.author박찬언-
dc.contributor.author안광덕-
dc.date.accessioned2024-01-21T22:32:52Z-
dc.date.available2024-01-21T22:32:52Z-
dc.date.created2022-01-10-
dc.date.issued1993-05-
dc.identifier.issn0379-153X-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146050-
dc.languageKorean-
dc.publisher한국고분자학회-
dc.titleSulfonate 광산발생제를 사용하는 화학증폭 포토레지스트의 Catalytic chain length 및 특성곡선-
dc.title.alternativeCatalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation폴리머, v.17, no.3, pp.335 - 340-
dc.citation.title폴리머-
dc.citation.volume17-
dc.citation.number3-
dc.citation.startPage335-
dc.citation.endPage340-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthorcatalytic chain length-
dc.subject.keywordAuthordeep UV photoresists-
dc.subject.keywordAuthorphotoacid generator-
dc.subject.keywordAuthorpyrogallol tris(methane sulfonate)-
dc.subject.keywordAuthort-BOC-protected phosphazene-
dc.subject.keywordAuthordissolution inhibition-
dc.subject.keywordAuthorchemical amplification resist-
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