DSpace at KIST: SiH4 를 이용한 텅스텐 화학증착시 압력증가가 증착에 미치는 영향

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DC Field	Value	Language
dc.contributor.author	박재현	-
dc.contributor.author	이정중	-
dc.contributor.author	금동화	-
dc.date.accessioned	2024-01-21T22:45:46Z	-
dc.date.available	2024-01-21T22:45:46Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1993-01	-
dc.identifier.issn	1225-8024	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/146264	-
dc.language	Korean	-
dc.publisher	한국표면공학회	-
dc.title	SiH4 를 이용한 텅스텐 화학증착시 압력증가가 증착에 미치는 영향	-
dc.title.alternative	The Effect of Pressure Increase on the Deposition of Tungsten by CVD using SiH4	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국표면공학회지, v.26, no.1, pp.3 - 9	-
dc.citation.title	한국표면공학회지	-
dc.citation.volume	26	-
dc.citation.number	1	-
dc.citation.startPage	3	-
dc.citation.endPage	9	-
dc.description.isOpenAccess	N	-
dc.description.journalRegisteredClass	other	-

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