Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안광덕 | - |
| dc.contributor.author | 정찬문 | - |
| dc.date.accessioned | 2024-01-21T22:46:18Z | - |
| dc.date.available | 2024-01-21T22:46:18Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1993-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/146273 | - |
| dc.title | Chemical amplification resists for microlithography. | - |
| dc.title.alternative | 고집적 반도체 초미세가공용 화학증폭성 레지스트 = | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | 화학세계, v.v. 33, no.no. 11, pp.835 - 841 | - |
| dc.citation.title | 화학세계 | - |
| dc.citation.volume | v. 33 | - |
| dc.citation.number | no. 11 | - |
| dc.citation.startPage | 835 | - |
| dc.citation.endPage | 841 | - |
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