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dc.contributor.authorHAN, IK-
dc.contributor.authorLEE, YJ-
dc.contributor.authorLEE, JI-
dc.contributor.authorKANG, KN-
dc.contributor.authorKIM, SY-
dc.date.accessioned2024-01-21T23:03:25Z-
dc.date.available2024-01-21T23:03:25Z-
dc.date.created2022-01-11-
dc.date.issued1992-12-15-
dc.identifier.issn0261-8028-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146336-
dc.languageEnglish-
dc.publisherCHAPMAN HALL LTD-
dc.subjectSILICON-NITRIDE-
dc.titleSPECTROSCOPIC ELLIPSOMETRIC MEASUREMENTS OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION-GROWN SINXINP STRUCTURE-
dc.typeArticle-
dc.identifier.doi10.1007/BF00736210-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS SCIENCE LETTERS, v.11, no.24, pp.1689 - 1691-
dc.citation.titleJOURNAL OF MATERIALS SCIENCE LETTERS-
dc.citation.volume11-
dc.citation.number24-
dc.citation.startPage1689-
dc.citation.endPage1691-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1992KD45100019-
dc.identifier.scopusid2-s2.0-34249843370-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusSILICON-NITRIDE-
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