DSpace at KIST: Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).

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DC Field	Value	Language
dc.contributor.author	안광덕	-
dc.contributor.author	채규호	-
dc.contributor.author	황인동	-
dc.contributor.author	박서호	-
dc.date.accessioned	2024-01-21T23:05:05Z	-
dc.date.available	2024-01-21T23:05:05Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1992-11	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/146363	-
dc.title	Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).	-
dc.title.alternative	원자외선 포토레지스트로서 PMMA 의 개질에 관한 연구 : 1. P(MMA-co-BOXM-co-TBMA) 의 광분해반응 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	폴리머 = Polymer(Korea), v.v. 16, no.no. 6, pp.669 - 679	-
dc.citation.title	폴리머 = Polymer(Korea)	-
dc.citation.volume	v. 16	-
dc.citation.number	no. 6	-
dc.citation.startPage	669	-
dc.citation.endPage	679	-
dc.subject.keywordAuthor	deep UV photoresist	-
dc.subject.keywordAuthor	photodegradation of poly(methyl methacrylate)	-
dc.subject.keywordAuthor	butanedione monooxime methacrylate	-
dc.subject.keywordAuthor	terpolymer	-
dc.subject.keywordAuthor	photosensitivity	-

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