DSpace at KIST: Synthesis of H//2-permselective silica films by chemical vapor deposition.

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DC Field	Value	Language
dc.contributor.author	하흥용	-
dc.contributor.author	홍성안	-
dc.contributor.author	남석우	-
dc.date.accessioned	2024-01-21T23:13:35Z	-
dc.date.available	2024-01-21T23:13:35Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1992-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/146504	-
dc.title	Synthesis of H//2-permselective silica films by chemical vapor deposition.	-
dc.title.alternative	화학증착 (CVD) 에 의한 선택적 수소 투과성 실리카막의 제조 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	멤브레인 = Membrane journal, v.v. 2, no.no. 1, pp.21 - 32	-
dc.citation.title	멤브레인 = Membrane journal	-
dc.citation.volume	v. 2	-
dc.citation.number	no. 1	-
dc.citation.startPage	21	-
dc.citation.endPage	32	-
dc.subject.keywordAuthor	H//2 selectivity	-
dc.subject.keywordAuthor	silica membrane	-
dc.subject.keywordAuthor	chemical vapor deposition	-

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