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dc.contributor.author김대준-
dc.contributor.author이형직-
dc.contributor.author전명철-
dc.contributor.author윤상옥-
dc.date.accessioned2024-01-21T23:32:22Z-
dc.date.available2024-01-21T23:32:22Z-
dc.date.created2022-01-10-
dc.date.issued1992-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146596-
dc.titleProcess for the Measurement of Radio-Frequency Induced Plasma-
dc.title.alternative고주파 유도 플라즈마의 계측 프로세스-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation요업재료의 과학과 기술, pp.178 - 188-
dc.citation.title요업재료의 과학과 기술-
dc.citation.startPage178-
dc.citation.endPage188-
dc.subject.keywordAuthorplasma-
dc.subject.keywordAuthorhigh frequency-
dc.subject.keywordAuthormeasurement-
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