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dc.contributor.author주병권-
dc.contributor.author하병주-
dc.contributor.author김철주-
dc.contributor.author오명환-
dc.contributor.author차균현-
dc.date.accessioned2024-01-21T23:33:19Z-
dc.date.available2024-01-21T23:33:19Z-
dc.date.created2022-01-10-
dc.date.issued1992-01-
dc.identifier.issn1225-0562-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146612-
dc.titleShort consideration on the non-uniformities existing at the etched-edges in deep anisotropic etching of (100) silicon-
dc.title.alternative(100) 실리콘의 깊은 비등방성 식각시 식각면의 가장자리에 존재하는 불균일성의 짤막한 고찰-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국재료학회지 = Korean Journal of Materials Research, v.2, no.5, pp.383 - 386-
dc.citation.title한국재료학회지 = Korean Journal of Materials Research-
dc.citation.volume2-
dc.citation.number5-
dc.citation.startPage383-
dc.citation.endPage386-
dc.subject.keywordAuthorMEMS-
dc.subject.keywordAuthormicromachining-
dc.subject.keywordAuthordeep silicon etching-
dc.subject.keywordAuthordiaphragm-
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