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dc.contributor.author김용-
dc.contributor.author김성일-
dc.contributor.author민석기-
dc.contributor.author엄경숙-
dc.contributor.author김무성-
dc.contributor.author곽병현-
dc.contributor.author마동성-
dc.date.accessioned2024-01-21T23:36:38Z-
dc.date.available2024-01-21T23:36:38Z-
dc.date.created2022-01-10-
dc.date.issued1992-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146667-
dc.title저압 MOCVD 에 의한 GaAs 에피층의 Carbon 도핑특성 .-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation응용물리, v.v. 5, no.no. 12, pp.586 - 590-
dc.citation.title응용물리-
dc.citation.volumev. 5-
dc.citation.numberno. 12-
dc.citation.startPage586-
dc.citation.endPage590-
dc.subject.keywordAuthor저압 MOCVD-
dc.subject.keywordAuthorGaAs-
dc.subject.keywordAuthorcarbon-doping-
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