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dc.contributor.authorHAN, IK-
dc.contributor.authorLEE, YJ-
dc.contributor.authorJO, JH-
dc.contributor.authorLEE, JI-
dc.contributor.authorKANG, KN-
dc.date.accessioned2024-01-21T23:44:33Z-
dc.date.available2024-01-21T23:44:33Z-
dc.date.created2022-01-11-
dc.date.issued1991-05-01-
dc.identifier.issn0261-8028-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146796-
dc.languageEnglish-
dc.publisherCHAPMAN HALL LTD-
dc.subjectFILMS-
dc.titleHEATING EFFECT IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE-
dc.typeArticle-
dc.identifier.doi10.1007/BF00726926-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS SCIENCE LETTERS, v.10, no.9, pp.526 - 528-
dc.citation.titleJOURNAL OF MATERIALS SCIENCE LETTERS-
dc.citation.volume10-
dc.citation.number9-
dc.citation.startPage526-
dc.citation.endPage528-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1991FL47200013-
dc.identifier.scopusid2-s2.0-34249924841-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusFILMS-
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