DSpace at KIST: Plasma enhanced chemical vapor deposition of low-resistive tungsten thin films.

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DC Field	Value	Language
dc.contributor.author	김용태	-
dc.contributor.author	민석기	-
dc.contributor.author	홍종성	-
dc.contributor.author	김충기	-
dc.date.accessioned	2024-01-22T00:01:50Z	-
dc.date.available	2024-01-22T00:01:50Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1991-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/146861	-
dc.title	Plasma enhanced chemical vapor deposition of low-resistive tungsten thin films.	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	Appl. phys. lett., v.v. 58, pp.837 - 839	-
dc.citation.title	Appl. phys. lett.	-
dc.citation.volume	v. 58	-
dc.citation.startPage	837	-
dc.citation.endPage	839	-

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