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dc.contributor.author김용태-
dc.contributor.author민석기-
dc.contributor.author김충기-
dc.date.accessioned2024-01-22T00:08:22Z-
dc.date.available2024-01-22T00:08:22Z-
dc.date.created2022-01-10-
dc.date.issued1991-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146969-
dc.titleA new method to suppress encroachment by plasma deposited tungsten thin films.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationAppl. phys. lett., v.v. 59, pp.916 - 918-
dc.citation.titleAppl. phys. lett.-
dc.citation.volumev. 59-
dc.citation.startPage916-
dc.citation.endPage918-
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