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dc.contributor.author한석희-
dc.contributor.author김희중-
dc.contributor.author노태환-
dc.contributor.author강일구-
dc.contributor.author이정중-
dc.date.accessioned2024-01-22T00:11:40Z-
dc.date.available2024-01-22T00:11:40Z-
dc.date.created2022-01-10-
dc.date.issued1990-11-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147024-
dc.title스파터링 조건이 Co-Hf-Pd 박막의 특성에 미치는 영향-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationKorean Applied Physics (Korean Physical Society), v.4, no.4, pp.523 - 528-
dc.citation.titleKorean Applied Physics (Korean Physical Society)-
dc.citation.volume4-
dc.citation.number4-
dc.citation.startPage523-
dc.citation.endPage528-
dc.subject.keywordAuthorCo alloy-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthorsputtering-
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