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dc.contributor.author안광덕-
dc.date.accessioned2024-01-22T00:34:58Z-
dc.date.available2024-01-22T00:34:58Z-
dc.date.created2022-01-10-
dc.date.issued1990-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147187-
dc.titleChemical modification of PMIPK resist.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationPolymers for microelectronics-science and technology, pp.269 - 281-
dc.citation.titlePolymers for microelectronics-science and technology-
dc.citation.startPage269-
dc.citation.endPage281-
dc.subject.keywordAuthorpoly(methyl isopropenyl ketone) [PMIPK]-
dc.subject.keywordAuthorPMIPK-oxime-
dc.subject.keywordAuthorphotosensitizer-
dc.subject.keywordAuthorphotosensitivity-
dc.subject.keywordAuthorphotodegradation-
dc.subject.keywordAuthorside-chain modification-
dc.subject.keywordAuthorpolymer reaction-
dc.subject.keywordAuthorphotoresist-
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