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dc.contributor.author김은규-
dc.contributor.author조훈영-
dc.contributor.author김성일-
dc.contributor.author민석기-
dc.date.accessioned2024-01-22T00:42:03Z-
dc.date.available2024-01-22T00:42:03Z-
dc.date.created2022-01-10-
dc.date.issued1989-10-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147303-
dc.titleExcimer 레이저 annealing 된 HB-GaAs 내의 깊은 준위 연구 .-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation새물리, v.v. 29, no.no. 5, pp.591 - 596-
dc.citation.title새물리-
dc.citation.volumev. 29-
dc.citation.numberno. 5-
dc.citation.startPage591-
dc.citation.endPage596-
dc.subject.keywordAuthorexcimer laser-
dc.subject.keywordAuthorHB-GaAs-
dc.subject.keywordAuthordeep level-
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