Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김용태 | - |
| dc.contributor.author | 김춘근 | - |
| dc.contributor.author | 민석기 | - |
| dc.date.accessioned | 2024-01-22T01:02:56Z | - |
| dc.date.available | 2024-01-22T01:02:56Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1989-01 | - |
| dc.identifier.issn | 0374-4884 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/147433 | - |
| dc.publisher | Korean Physical Society | - |
| dc.title | Microwave plasma enhanced chemical vapor deposition of silicon nitride films. | - |
| dc.type | Article | - |
| dc.description.journalClass | 2 | - |
| dc.identifier.bibliographicCitation | Journal of the Korean Physical Society, v.22, pp.197 - 202 | - |
| dc.citation.title | Journal of the Korean Physical Society | - |
| dc.citation.volume | 22 | - |
| dc.citation.startPage | 197 | - |
| dc.citation.endPage | 202 | - |
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