Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 강문상 | - |
| dc.contributor.author | Lim Tae Hoon | - |
| dc.date.accessioned | 2024-02-21T05:06:34Z | - |
| dc.date.available | 2024-02-21T05:06:34Z | - |
| dc.date.issued | 1996-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/148832 | - |
| dc.title | Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD. | - |
| dc.title.alternative | Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD. | - |
| dc.type | Book | - |
| dc.citation.startPage | 1696 | - |
| dc.citation.endPage | ? | - |
| dc.relation.isPartOfSeries | 37th annual meeting of the division of plasma physics, American physicsl society, Kentucky, USA | - |
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