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Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.

Other Titles: Characteristics of hydrogenated amorphous and recrystallized Si films with the variation of the substrate temperature in ECR plasma CVD.

Authors: 강문상; Lim Tae Hoon

Issue Date: 1996-01

URI: https://pubs.kist.re.kr/handle/201004/148832

Appears in Collections:: KIST Publication > Others

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