Nitrogen implanted tungsten thin films for Cu diffusion barrier.

Other Titles
Nitrogen implanted tungsten thin films for Cu diffusion barrier.
Authors
Kim Yong TaeD. J. KimC. S. KwonI. H. ChoiMin Suk-Ki
Issue Date
1994-01
URI
https://pubs.kist.re.kr/handle/201004/148929
Appears in Collections:
KIST Publication > Others
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