Atomic Layer Deposition of Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films

Authors
Cho, Jung WooSong, Myeong SeopChoi, In HyeokGo, Kyoung-JuneHan, JaewooLee, Tae YoonAn, ChihwanChoi, Hyung-JinSohn, ChangheePark, Min HyukBaek, Seung-HyubLee, Jong SeokChoi, Si-YoungChae, Seung Chul
Issue Date
2024-02
Publisher
John Wiley & Sons Ltd.
Citation
Advanced Functional Materials
Abstract
The groundbreaking discovery of unconventional ferroelectricity in HfO2 opens exciting prospects for next-generation memory devices. However, the practical implementation, particularly its epitaxial stabilization and a clearer understanding of its intrinsic ferroelectricity has been a significant challenge. The study arouses the potential importance of atomic layer deposition (ALD) for mass production in modern industries, demonstrating its proficiency in achieving epitaxial growth of ferroelectric Hf0.5Zr0.5O2 (HZO) thin films on Yttria-stabilized zirconia (YSZ) substrates. Moreover, with distinct ferroelectric switching currents, the work reveals the ferroelectric characteristics of epitaxial HZO thin films deposited through ALD on YSZ-buffered Si substrates, which aligns well with CMOS technology. Overall, the results pave the way for a scalable synthesis system for ferroelectric HfO2-based materials, hinting at a bright future for low-temperature epitaxial nanoelectronics.
Keywords
YTTRIA-STABILIZED ZIRCONIA; GROWTH; atomic layer deposition; epitaxial growth; ferroelectricity; HfO2
ISSN
1616-301X
URI
https://pubs.kist.re.kr/handle/201004/149287
DOI
10.1002/adfm.202314396
Appears in Collections:
KIST Article > 2024
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