Highly conductive and flexible transparent hybrid superlattices with gas-barrier properties: Implications in optoelectronics
- Authors
- Park, Jaeyoung; Hoang Giang, Pham; Kim, Jongchan; Khanh Nguyen, Quang; Cho, Sangho; Mo Sung, Myung
- Issue Date
- 2024-06
- Publisher
- Elsevier BV
- Citation
- Applied Surface Science, v.658
- Abstract
- Transparent electrodes and passivation layers find extensive application in optoelectronic devices such as light-emitting diodes, solar cell. Integrating transparent conductive and gas diffusion barrier layers into a unified component holds promise for enhancing device performance and cost-effectiveness. However, research on these dual-function materials remains relatively scarce. Here, we introduce an innovative hybrid superlattice composed of ZnO and self-assembled monolayers, designed to function simultaneously as transparent conductive and gas diffusion barrier. Fabricated using low-temperature atomic layer deposition and molecular layer deposition techniques, the hybrid superlattice exhibited robust electric conductivity (surpassing 1400 S cm-1), exceptional moisture barrier characteristics (water vapor transmission rate < 4 × 10-7 g m-2 day-1), and remarkable flexibility. We systematically investigated the significant electrical improvement, attributing it to the formation of a well-defined amorphous/crystalline phase-composite structure in the ZnO nanolayer. Moreover, the organic layers in the superlattice enhance resilience against environmental degradation and mechanical deformation by forming a multilayered structure that effectively decouples defects in the underlying layers. These compelling features position the hybrid superlattice as a promising candidate for transparent conductive gas diffusion barriers, with diverse applications in emerging optoelectronics.
- Keywords
- THIN-FILMS; OPTICAL-PROPERTIES; ENCAPSULATION; PERFORMANCE; PERMEATION; ATOMIC LAYER DEPOSITION; AL-DOPED ZNO; Encapsulation; Low -temperature deposition; Atomic layer deposition; Molecular layer deposition; Optoelectronics; Transparent conductive films; Transparent conductive oxides
- ISSN
- 0169-4332
- URI
- https://pubs.kist.re.kr/handle/201004/149450
- DOI
- 10.1016/j.apsusc.2024.159850
- Appears in Collections:
- KIST Article > 2024
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