Probing Local Electronic Structure of Amorphous MgO Thin Films by Angle Dependent Soft X-ray Absorption Spectroscopy: Impact of Heavy Ions

Authors
Singh, Jitendra PalKumar, ManishLim, Weon CheolGautam, SanjeevKandasami, AsokanLee, SangsulChae, Keun Hwa
Issue Date
2025-02
Publisher
한국전기전자재료학회
Citation
Transactions on Electrical and Electronic Materials, v.26, no.1, pp.18 - 28
Abstract
The present study investigates the local electronic structures of amorphous thin films before and after 100 MeV O 7+ ion irradiation by using the angle-dependent near-edge X-ray absorption fine structure (NEXAFS) measurements at O and Mg K -edges. X-ray diffraction study reveals that as-grown film is amorphous in nature and it remains unaltered after ion irradiation. Post-irradiated film exhibits the onset of surface modifications as revealed from X-ray reflectivity measurements. The spectral features appearing in O K - and Mg K -edge NEXAFS measurements for pristine and irradiated films exhibit the characteristics of MgO. Less intense spectral features in the irradiated thin films are evident due to distortion in Mg 2+ ion coordination induced by the bombardment of 100 MeV O 7+ ions.
Keywords
Ion Irradiation; Coordination; NEXAFS; Surface Modification
ISSN
1229-7607
URI
https://pubs.kist.re.kr/handle/201004/152263
DOI
10.1007/s42341-024-00582-9
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KIST Article > Others
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