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Results 1-8 of 8 (Search time: 0.003 seconds).

Issue Date	Title	Author(s)
1995-01	New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface.	Kim Yong Tae; S. K. Kwak; C. S. Kwon; D. J. Kim; C. W. Lee; I. H. Choi; Min Suk-Ki
1993-01	Effects of nitrogen on the stress of plasma deposited tungsten and tungsten nitride thin films.	Kim Yong Tae; S. J. Lee; C. S. Kwon; Y. W. Park; C. C. Lee; C. W. Lee; Min Suk-Ki
1993-01	Atomic force microscopic observation in the surface morphologies and roughness of plasma deposited tungsten and tungsten nitride thin films.	Kim Yong Tae; C. S. Kwon; I. H. Choi; C. W. Lee; Min Suk-Ki
1994-01	Comparison of high temperature thermal stability of Ru and RuO//2 schottky contact to GaAs.	Kim Yong Tae; S. K. Kwak; C. W. Lee; J. G. Lee; C. S. Kwon; K. S. Jung; Min Suk-Ki
1994-01	Post annealing characteristics of RF magnetron sputtered PbTiO//3 films.	Kim Yong Tae; H. N. Lee; J. G. Lee; C. S. Kwon; S. H. Choh; Min Suk-Ki
1994-01	Characteristics of RF magnetron sputtered (Ba, Sr)TiO//3 thin films on RuO//2 bottom electrode.	Kim Yong Tae; J. G. Lee; H. N. Lee; C. S. Kwon; S. H. Choh; Min Suk-Ki
1993-01	Comparison of plasma deposited tungsten and tungsten nitride schottky contacts to GaAs.	Kim Yong Tae; S. J. Lee; C. S. Kwon; C. W. Lee; Min Suk-Ki
1994-01	Nitrogen implanted tungsten thin films for Cu diffusion barrier.	Kim Yong Tae; D. J. Kim; C. S. Kwon; I. H. Choi; Min Suk-Ki

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