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알루미나 완충층을 포함하는 고밀도의 압전 후막 및 그 제조방법

Author

최지원; 신태희; 송현철; 윤석진

Assignee

한국과학기술연구원

Regitration Date

2013-08-29

Registration No.

1303924

Application Date

2011-11-28

Application No.

2011-0125270

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/77503

Appears in Collections:

KIST Patent > Others

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