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Low temperature crystallization of SrBi2Ta2O9 film by excimer laser irradiation

Authors
Seol, K.S.; Hiramatsu, H.; Ohki, Y.; Shin, D.-S.; Choi, I.-H.; Kim, Y.-T.
Issue Date
1999-11
Publisher
Materials Research Society
Citation
1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998', pp.293 - 298
Abstract
Using a KrF or ArF excimer laser as an irradiation photon source, we have succeeded in crystallizing amorphous SrBi2Ta2O9 films at 200-290°C, quite lower temperatures than the conventional crystallization temperature. The crystallization is enhanced when the substrate temperature, irradiation time, or the laser power density is higher.
ISSN
0272-9172
URI
https://pubs.kist.re.kr/handle/201004/84870
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KIST Conference Paper > Others
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