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Thermal stabilites of PECVD W-B-N thin films as a diffusion barrier

Authors

Kim, Yong Tae

Issue Date

1997-07-01

Citation

Microelectronic Manufacturing(SPIE-The International Society of Optical Eng. Austin Texas, 1-2 Oct.1997) Proc. of SPIE, pp.48 - 56

URI

https://pubs.kist.re.kr/handle/201004/85509

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KIST Conference Paper > Others

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