Electrical properties of amorphous hafnium-indium-zinc-oxide thin film transistors with highly conductive buried layer

Authors
Chong Eu GeneLee Sang Yeol
Citation
7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics
URI
https://pubs.kist.re.kr/handle/201004/97960
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KIST Conference Paper > Others
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