플라즈마 이온 주입에 의한 고분자 소재의 표면개질 방법 및 그 장치

Author
이연희한승희
Assignee
한국과학기술연구원
Regitration Date
1999-06-04
Registration No.
0217538
Application Date
1996-04-10
Application No.
1996-0010740
Country
KO
URI
https://pubs.kist.re.kr/handle/201004/99901
Appears in Collections:
KIST Patent > Others
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