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Showing results 1 to 3 of 3

Issue DateTitleAuthor(s)
-Actinic EUV Mask Inspection using Coherent EUV Source based on High-order Harmonic GenerationKim Yong Soo; Park June; Park Han Young; Hamin Sung; Jomsool Kim; Seung Beom Lee; Hyun Woo Cho; Ju Han Lee; Park, Min-Chul; Jhon, Young Min
-CD Measurements of EUV Mask using a Coherent Scattering Microscope Mask Inspection ToolKim Yong Soo; Park June; 성하민; 김점술; 이승범; 조현우; Park, Min-Chul; Cho, Woon Jo; Kim, Yong Tae; 이주한; Jhon, Young Min
-CSM(Coherent Scattering Microscope) system development for next generation EUV photomask inspection박한용; 김용수; 성하민; 김점술; 이승범; 조현우; 이주한; Kim, Yong Tae; Jhon, Young Min
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