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CD Measurements of EUV Mask using a Coherent Scattering Microscope Mask Inspection Tool

Other Titles

CSM 마스크 검사장비를 이용한 EUV 마스크의 CD 측정

Authors

Kim Yong Soo; Park June; 성하민; 김점술; 이승범; 조현우; Park, Min-Chul; Cho, Woon Jo; Kim, Yong Tae; 이주한; Jhon, Young Min

Citation

차세대 리소그래피 학술대회, v.W-II-7, pp.189 - 190

Keywords

CSM; Coherent; EUV; Mask Inspection; CD Measurement

URI

https://pubs.kist.re.kr/handle/201004/90468

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KIST Conference Paper > Others

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