Characterization of interface between amorphous Ge2Sb2Te5 and TiN by x-ray photoelectron spectroscopy

Authors
Jeong, Doo SeokLee SuyounJeung-hyun JeongCHEONG, BYUNG KICheol Seong Hwang
Citation
European|Phase Change and Ovonics Symposium 2009, pp.176 - 180
Keywords
chalcogenice; x-ray photoelectron spectroscopy; interfacial dipole layer; Ge2Sb2Te5
URI
https://pubs.kist.re.kr/handle/201004/101158
Appears in Collections:
KIST Conference Paper > Others
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