Fabrication of Metal Nano Dot Dry Etching Mask Using Block Copolymer Thin Film

Authors
Kang Gil BumKim, Seong IlKim, Yong TaeLee Chang Woo
Citation
NANO KOREA 2007, pp.272
Keywords
Metal nanodot; copolymer lithography; Reactive ion etching
URI
https://pubs.kist.re.kr/handle/201004/103455
Appears in Collections:
KIST Conference Paper > Others
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