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Plasma-enhanced chemical vapor deposition of silicon oxynitride films and their gas barrier properties

Authors

Shim, Juno; Kwak, Soonjong

Citation

Polymer Processing Society

Keywords

silicon oxynitride; plasma enhanced chemical vapor deposition; gas barrier; plastic substrate

URI

https://pubs.kist.re.kr/handle/201004/105868

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KIST Conference Paper > Others

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