KIST Library Institutional Repository

Aluminum nitride thin film deposition using noble single precursor by MOCVD

Other Titles

유기금속화합물을 이용한 질화알루미늄(AlN) 박막 제조

Authors

경제홍; CHO SEONG HOON; HAN SUNG HAN; 최승철

Citation

1999년도 춘계총회, 초청·특별강연, 연구발표회, pp.102

Keywords

AlN; MOCVD; single precursor

URI

https://pubs.kist.re.kr/handle/201004/109377

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML