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Relationship between the shape of KOH-etched bonding interface and the interfacial oxide condition in silicon direct bonding

Other Titles

실리콘 직접 접합에 있어서 KOH-식각된 접합계면의 모양과 계면산화막의 상태간의 관계

Authors

Ju Byeong Kwon; 차균현; OH MYUNG HWAN

Citation

전자공학회 하계종합학술대회, 전북대, pp.445 - 448

URI

https://pubs.kist.re.kr/handle/201004/112230

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KIST Conference Paper > Others

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