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Elimination of hole traps on Si wafer using reoxidation method

Other Titles

Reoxidatoin법을 이용한 Si wafer의 hole trap의 제거

Authors

홍순관; Ju Byeong Kwon; 김철주

Citation

전자공학회 하계종합학술대회, 포항공대, pp.433 - 435

URI

https://pubs.kist.re.kr/handle/201004/112801

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KIST Conference Paper > Others

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