Hybrid dielectrics composed of Al2O3 and phosphonic acid self-assembled monolayers for performance improvement in low voltage organic field effect transistors
- Authors
- Jang, Sukjae; Son, Dabin; Hwang, Sunbin; Kang, Minji; Lee, Seoung-Ki; Jeon, Dae-Young; Bae, Sukang; Lee, Sang Hyun; Lee, Dong Su; Kim, Tae-Wook
- Issue Date
- 2018-07
- Publisher
- Springer | Korea Nano Technology Research Society
- Citation
- Nano Convergence, v.5
- Abstract
- Low voltage operational organic transistors (< 4 V) based on pentacene were successfully fabricated with hybrid dielectric films composed of aluminum oxide using atomic layer deposition and various phosphonic acid-based self-assembled monolayers as the gate dielectrics. High capacitances up to 279 nF/cm(2), low leakage current densities of 10(-8) A/cm(2) at 6 V, and high breakdown fields up to 7.5 MV/cm were obtained. The transistors with the octade-cylphosphonic acid hybrid dielectric exhibited an improved saturation mobility of 0.58 cm(2)/Vs, a subthreshold slope of 151 mV/decade, a threshold voltage of -1.84 V and an on-off current ratio of 10(6). The low surface energies of the self-assembled monolayers having non-polar terminal groups, such as methyl and pentafluorophenoxy, improved the carrier conduction of the transistors due to the pentacene growth with an edge-on orientation for low voltage operation. The pentafluorophenoxy end-group showed an accumulation of holes at the semiconductor-dielectric interface.
- Keywords
- ATOMIC-LAYER-DEPOSITION; THIN-FILM TRANSISTORS; GATE DIELECTRICS; LOW-TEMPERATURE; DENSITY; Hybrid dielectrics; ALD Al2O3; PA-SAM; Phosphonic acid; Water contact angle; Organic transistor
- ISSN
- 2196-5404
- URI
- https://pubs.kist.re.kr/handle/201004/121200
- DOI
- 10.1186/s40580-018-0152-3
- Appears in Collections:
- KIST Article > 2018
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