Four-Bits-Per-Cell Operation in an HfO2-Based Resistive Switching Device

Authors
Kim, Gun HwanJu, HyunsuYang, Min KyuLee, Dong KyuChoi, Ji WoonJang, Jae HyuckLee, Sang GilCha, Ik SuPark, Bo KeunHan, Jeong HwanChung, Taek-MoKim, Kyung MinHwang, Cheol SeongLee, Young Kuk
Issue Date
2017-10-25
Publisher
WILEY-V C H VERLAG GMBH
Citation
SMALL, v.13, no.40
Abstract
The quadruple-level cell technology is demonstrated in an Au/Al2O3/HfO2/TiN resistance switching memory device using the industry-standard incremental step pulse programming (ISPP) and error checking/correction (ECC) methods. With the highly optimistic properties of the tested device, such as self-compliance and gradual set-switching behaviors, the device shows 6s reliability up to 16 states with a state current gap value of 400 nA for the total allowable programmed current range from 2 to 11 mu A. It is demonstrated that the conventional ISPP/ECC can be applied to such resistance switching memory, which may greatly contribute to the commercialization of the device, especially competitively with NAND flash. A relatively minor improvement in the material and circuitry may enable even a five-bits-per-cell technology, which can hardly be imagined in NAND flash, whose state-of-the-art multiple-cell technology is only at three-level (eight states) to this day.
Keywords
THERMAL AGITATION; MEMORY; DIODE; COST; THERMAL AGITATION; MEMORY; DIODE; COST; error checking/correction (ECC) algorithm; HfO2; incremental step pulse programming (ISPP); quadruple-level cell (QLC); resistive switching (RS) memory
ISSN
1613-6810
URI
https://pubs.kist.re.kr/handle/201004/122149
DOI
10.1002/smll.201701781
Appears in Collections:
KIST Article > 2017
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