High-performance black phosphorus top-gate ferroelectric transistor for nonvolatile memory applications

Authors
Lee, Young TackHwang, Do KyungChoi, Won Kook
Issue Date
2016-10
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.69, no.8, pp.1347 - 1351
Abstract
Two-dimensional (2D) van der Waals (vdW) atomic crystals have been extensively studied and significant progress has been made. The newest 2D vdW material, called black phosphorus (BP), has attracted considerable attention due to its unique physical properties, such as its being a singlecomponent material like graphene, and its having a high mobility and direct band gap. Here, we report on a high-performance BP nanosheet based ferroelectric field effect transistor (FeFET) with a poly(vinylidenefluoride-trifluoroethylene) top-gate insulator for a nonvolatile memory application. The BP FeFETs show the highest linear hole mobility of 563 cm(2)/Vs and a clear memory window of more than 15 V. For more advanced nonvolatile memory circuit applications, two different types of resistive-load and complementary ferroelectric memory inverters were implemented, which showed distinct memory on/off switching characteristics.
Keywords
FIELD-EFFECT TRANSISTORS; P-N DIODE; LAYER; METAL; GAP; HETEROJUNCTION; JUNCTIONS; CONTACTS; MOBILITY; FIELD-EFFECT TRANSISTORS; P-N DIODE; LAYER; METAL; GAP; HETEROJUNCTION; JUNCTIONS; CONTACTS; MOBILITY; Black Phosphorus (BP); Ferroelectric field-effect transistor (FeFET); Nonvolatile memory
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/123596
DOI
10.3938/jkps.69.1347
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KIST Article > 2016
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