Fully subthreshold current-based characterization of interface traps and surface potential in III-V-on-insulator MOSFETs
- Authors
- Kim, Seong Kwang; Lee, Jungmin; Geum, Dae-Myeong; Park, Min-Su; Choi, Won Jun; Choi, Sung-Jin; Kim, Dae Hwan; Kim, Sanghyeon; Kim, Dong Myong
- Issue Date
- 2016-08
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Citation
- SOLID-STATE ELECTRONICS, v.122, pp.8 - 12
- Abstract
- We report characterization of the interface trap distribution (D-it(E)) over the bandgap in III-V metal-oxide- semiconductor field-effect transistors (MOSFETs) on insulator. Based only on the experimental subthreshold current data and differential coupling factor, we simultaneously obtained D-it(E) and a nonlinear mapping of the gate bias (V-GS) to the trap level (E-t) via the effective surface potential (psi(S),(eff)). The proposed technique allows direct extraction of the interface traps at the In0.53Ga0.47As-on insulator (-OI) MOSFETs only from the experimental subthreshold current data. Applying the technique to the In0.53Ga0.47As channel III-V-OI MOSFETs with the gate width/length W/L = 100/50, 100/25, and 100/10 mu m/mu m, we obtained D-it(E) congruent to 10(11)-10(12) eV(-1) cm(-2) over the bandgap without the dimension dependence. (C) 2016 Elsevier Ltd. All rights reserved.
- Keywords
- OXIDE INTERFACE; STATES; OXIDE INTERFACE; STATES; Interface trap; InGaAs-OI MOSFETs; III-V; Subthreshold current model
- ISSN
- 0038-1101
- URI
- https://pubs.kist.re.kr/handle/201004/123840
- DOI
- 10.1016/j.sse.2016.04.011
- Appears in Collections:
- KIST Article > 2016
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