High-Mobility Transistors Based on Large-Area and Highly Crystalline CVD-Grown MoSe2 Films on Insulating Substrates
- Authors
- Rhyee, Jong-Soo; Kwon, Junyeon; Dak, Piyush; Kim, Jin Hee; Kim, Seung Min; Park, Jozeph; Hong, Young Ki; Song, Won Geun; Omkaram, Inturu; Alam, Muhammad A.; Kim, Sunkook
- Issue Date
- 2016-03-23
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- ADVANCED MATERIALS, v.28, no.12, pp.2316 - 2321
- Abstract
- Large-area and highly crystalline CVD-grown multilayer MoSe2 films exhibit a well-defined crystal structure (2H phase) and large grains reaching several hundred micrometers. Multilayer MoSe2 transistors exhibit high mobility up to 121 cm(2) V(-1)s(-1) and excellent mechanical stability. These results suggest that high mobility materials will be indispensable for various future applications such as high-resolution displays and human-centric soft electronics.
- Keywords
- GRAIN-BOUNDARIES; DIRECT BANDGAP; ATOMIC LAYERS; THIN; TRANSPORT; GRAIN-BOUNDARIES; DIRECT BANDGAP; ATOMIC LAYERS; THIN; TRANSPORT; insulating substrates; MoSe2; single-crystals; thin-film transistors; transition metal dichalcogenides
- ISSN
- 0935-9648
- URI
- https://pubs.kist.re.kr/handle/201004/124277
- DOI
- 10.1002/adma.201504789
- Appears in Collections:
- KIST Article > 2016
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