High-Mobility Transistors Based on Large-Area and Highly Crystalline CVD-Grown MoSe2 Films on Insulating Substrates

Authors
Rhyee, Jong-SooKwon, JunyeonDak, PiyushKim, Jin HeeKim, Seung MinPark, JozephHong, Young KiSong, Won GeunOmkaram, InturuAlam, Muhammad A.Kim, Sunkook
Issue Date
2016-03-23
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED MATERIALS, v.28, no.12, pp.2316 - 2321
Abstract
Large-area and highly crystalline CVD-grown multilayer MoSe2 films exhibit a well-defined crystal structure (2H phase) and large grains reaching several hundred micrometers. Multilayer MoSe2 transistors exhibit high mobility up to 121 cm(2) V(-1)s(-1) and excellent mechanical stability. These results suggest that high mobility materials will be indispensable for various future applications such as high-resolution displays and human-centric soft electronics.
Keywords
GRAIN-BOUNDARIES; DIRECT BANDGAP; ATOMIC LAYERS; THIN; TRANSPORT; GRAIN-BOUNDARIES; DIRECT BANDGAP; ATOMIC LAYERS; THIN; TRANSPORT; insulating substrates; MoSe2; single-crystals; thin-film transistors; transition metal dichalcogenides
ISSN
0935-9648
URI
https://pubs.kist.re.kr/handle/201004/124277
DOI
10.1002/adma.201504789
Appears in Collections:
KIST Article > 2016
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