Microstructure and Properties of Silicon-Incorporated DLC Film Fabricated Using HMDS Gas and RF-PECVD Process

Authors
Song, Byung JuSong, Woo JinHan, Jun HyunKim, Ka RamYoon, Su JongKim, Tae GyuKim, Jin KonCho, HyunKim, Gyeung-HoHwang, Dae YounKim, Hye Sung
Issue Date
2014-12
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.14, no.12, pp.9124 - 9130
Abstract
The microstructure and characteristics of silicon-incorporated diamond-like carbon film, fabricated using a radio-frequency plasma-enhanced chemical vapor deposition process with hexamethyldisilane [(CH3)(3)Si center dot Si(CH3)(3):HMDS] gas as a silicon source, were investigated. Diamond-like carbon films with silicon compositions from 0 to 5 atomic percent were deposited onto ultra-fine grained AZ31 magnesium alloy substrate as buffer layers or multilayers. Si doping led not only to an increase in the bonding ratio (sp(3)/sp(2)), but improvements in hardness, critical adhesion, and corrosion resistance. Out of the investigated samples, the multi-deposited silicon diamond-like carbon thin film on magnesium substrate showed the best combination of adhesive, wear resistance, and corrosion resistance properties.
Keywords
TRIBOLOGICAL PROPERTIES; MECHANICAL-PROPERTIES; SI-INCORPORATION; PLASMA CVD; CARBON; COATINGS; ADHESION; DEPOSITION; WEAR; TRIBOLOGICAL PROPERTIES; MECHANICAL-PROPERTIES; SI-INCORPORATION; PLASMA CVD; CARBON; COATINGS; ADHESION; DEPOSITION; WEAR; Hexamethyldisilane; Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition; Multilayered Silicon-Doped Diamond-Like Carbon; Magnesium Alloy Substrate
ISSN
1533-4880
URI
https://pubs.kist.re.kr/handle/201004/126064
DOI
10.1166/jnn.2014.10101
Appears in Collections:
KIST Article > 2014
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