Thermopower Enhancement of Bi2Te3 Films by Doping I Ions

Authors
Kim, Kwang-ChonBaek, Seung-HyubKim, Hyun JaeHyun, Dow-BinKim, Seong KeunKim, Jin-Sang
Issue Date
2014-06
Publisher
SPRINGER
Citation
JOURNAL OF ELECTRONIC MATERIALS, v.43, no.6, pp.2000 - 2005
Abstract
The thermoelectric properties of I-doped Bi2Te3 films grown by metal-organic chemical vapor deposition have been studied. I-doped epitaxial (00l) Bi2Te3 films were successfully grown on 4A degrees tilted GaAs (001) substrates at 360 A degrees C. I concentration in the Bi2Te3 films was easily controlled by the variation in a flow rate of H-2 carrier gas for the delivery of an isopropyliodide precursor. As I ions in the as-grown Bi2Te3 films were not fully activated, they did not influence the carrier concentration and thermoelectric properties. However, a post-annealing process at 400 A degrees C activated I ions as a donor, accompanied with an increase in the carrier concentration. Interestingly, the I-doped Bi2Te3 films after the post-annealing process also exhibited enhancement of the Seebeck coefficient at the same electron concentration compared to un-doped Bi2Te3 films. Through doping I ions into Bi2Te3, the thermopower was also enhanced in Bi2Te3, and a high power factor of 5 x 10(-3) W K-2 m(-1) was achieved.
Keywords
MOCVD; Bi2Te3; thermoelectric property; iodine doping
ISSN
0361-5235
URI
https://pubs.kist.re.kr/handle/201004/126745
DOI
10.1007/s11664-013-2934-z
Appears in Collections:
KIST Article > 2014
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